Brute Hydrazine

RASIRC BRUTE Hydrazine delivers water-free hydrazine (N2H4) gas into atomic layer deposition (ALD) processes in a repeatable method. BRUTE Hydrazine includes a vaporizer pre-loaded with hydrazine and a
proprietary solvent.
BRUTE Hydrazine can be used for a variety of metal nitride deposition processes at temperatures
below 400°C:
• Precursor for Ti3N4 gate stack and other transistor applications
• Sidewall spacer/etch stop (Si3N4) between metals and silicon or dielectric materials
• Double patterning involving SiO2 and Si3N4
• SiGe passivation layer
• Metal nitride deposition (TaN WN)

Low Pressre Casting

KM Aluminum is a self-casting alloy developed and can handle up to 1,500kg of product weight.
Minimizes internal bubble defects and oxide film curl, so that in vacuum reachability and leakage rate.
We secured the same quality as conventional aluminum products.
Several parts can be made from one casting, so Cost Down !!!

High Purity Aluminium

High purity aluminum material applied to aluminum parts for semiconductors.
Minimizes metal contamination and greatly improves corrosion resistance and withstand voltage characteristics.

SMA 디지털 압력 게이지

SMA모델은 접액부가 STS316L로 되어 있어 부식성 매체에도 사용이 가능합니다. 마이크로프로세서를 내장하고 LED 디스플래이와 아날로그 출력1~5VDC, 2채널 NPN 오픈콜렉터 출력의 특징을 갖는 압력 게이지입니다.
Application : 프로세스 제어, 유공압 측정, 반도체장비, 콤프레서, 냉각기

ATOKIT

VAPBOX 1500

Innovative, high power(1.7kW), non contact, flash DLI Vaporizer for solid and liquid precursors used in CVD, ALD and all gas phase processes with one or two liquid inlets.